Polishing Cloths
Metallographic polishing cloths in a full range of nap types and backings, for every polishing stage from coarse diamond through final oxide polishing. Available in 8-inch, 10-inch, and 12-inch diameters with PSA-adhesive or magnetic backing, and in napless woven, low-nap, high-nap, and porous chemical types, our cloths are comparable to the polishing cloths from Buehler, Struers, and Allied High Tech, typically 20 to 40 percent lower in price. Used across metallography, ceramics, optics, and electronics preparation.
Matching Cloth to Polishing Step
Cloth nap governs cutting rate, surface finish, edge retention, and flatness. A firm, napless surface holds the specimen flat and preserves edges but cuts less aggressively; a soft, high-nap surface carries abrasive and reaches recesses but rounds edges and introduces relief if used too early. Match the nap to the abrasive size and the step:
| Stage | Abrasive | Nap / Cloth Class | Why |
|---|---|---|---|
| Planar / coarse diamond | 30–9 micron diamond | Napless woven and mesh (e.g. Planar-G Mesh, Hard Woven, Gold Woven) | Maximum flatness and edge retention; removes grinding damage without rounding. |
| Intermediate diamond | 6–3 micron diamond | Low-nap woven and satin | Refines the surface while still holding flatness on most metals. |
| Fine diamond | 1–0.25 micron diamond | Low-nap to medium-nap | Near-mirror finish; slightly softer nap carries the finer abrasive. |
| Final oxide polish | 0.06 micron colloidal silica or 0.05 micron alumina | High-nap napped and porous chemical (e.g. Red Felt, Natural Wool, Chem Cloth, Non-Woven) | Holds oxide slurry for the chemo-mechanical step (EBSD, SEM). |
Material-Specific Notes
Soft and delicate materials polish best on low-nap cloths that minimize relief and edge rounding. Hard materials and ceramics hold their edges on napless woven and mesh cloths, which also give the flatness those materials need. Ferrous metals and general final polishing suit napped wool and felt cloths for the oxide step. Refractory alloys and coatings do well on firm woven and silk-type cloths that resist pull-out. When in doubt, use the least aggressive nap that still removes the prior scratch pattern in a reasonable time.
PSA or Magnetic Backing
PSA (pressure-sensitive adhesive) backing adheres directly to the platen and is the simplest option. Magnetic backing mounts and removes in seconds on a magnetic platen, which speeds cloth changes in high-throughput labs and keeps the cloth registered flat. Both are available in 8-inch, 10-inch, and 12-inch diameters.
Frequently Asked Questions
How do I choose the right polishing cloth?
Match the nap to the step: napless woven and mesh cloths for planar and coarse diamond and for edge retention; low-nap woven and satin for intermediate and fine diamond; napped wool, felt, and porous chemical cloths for the final oxide step. Using too high a nap too early rounds edges and introduces relief, so step up in nap gradually.
Which cloth gives the best edge retention?
Napless woven and mesh cloths give the best edge retention and flatness, because the firm, low-profile surface does not let the specimen edge round over. They are the correct choice for coarse and intermediate diamond steps, for hard materials and ceramics, and whenever preserving a coating or interface edge is critical.
PSA or magnetic backing?
PSA backing adheres directly to the platen and is simplest for occasional changes. Magnetic backing mounts and removes quickly on a magnetic platen and is preferred where cloths are changed frequently. Both come in 8-inch, 10-inch, and 12-inch sizes to fit standard grinder-polisher platens.
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